Plasma dynamics as a key to successful upscaling of pulsed plasma processes

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 118-123

  Laimer, J ^a   Fink, M ^a   Beer, T A ^a   Stori H ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Bipolar discharge; Plasma dynamics; Plasma assisted chemical vapour deposition; Titanium nitride; Unipolar discharge

Indexed keywords

ELECTRIC POTENTIAL; ORGANIC COATINGS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VIDEO CAMERAS;

HARD COATINGS;

PLASMA THEORY;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042357330     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00423-7     Document Type: Article

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