Influence of pressure on an asymmetric, radio frequency discharge with methane

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 2173-2178

  Hegemann, D ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Deposition rate; Plasma polymerization; Pressure; Specific energy

Indexed keywords

ACTIVATION ENERGY; DEPOSITION; METHANE; PLASMA POLYMERIZATION; PRESSURE EFFECTS; THIN FILMS;

CORNER-DOMINATED DISCHARGES; DEPOSITION RATES; SPECIFIC ENERGY;

ELECTRIC DISCHARGES;

EID: 33750833410     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.06.020     Document Type: Article

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