Time-resolved electrostatic probe studies of a pulsed inductively-coupled plasma

Plasma Sources Science and Technology

Volumn 8, Issue 4, 1999, Pages 594-602

  Tang, Xianmin ^a   Manos, Dennis M ^a  

^a The College of William and Mary   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; ELECTROSTATICS; MATHEMATICAL MODELS; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; PLASMA PROBES; PLASMA SHEATHS;

ELECTROSTATIC PROBES; PULSED INDUCTIVELY-COUPLED PLASMAS;

PLASMA SOURCES;

EID: 0033349352     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/4/311     Document Type: Article

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