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Volumn 5, Issue 2, 1996, Pages 145-158

Global models of pulse-power-modulated high-density, low-pressure discharges

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHLORINE; MATHEMATICAL MODELS; PLASMA DENSITY;

EID: 0030134012     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/006     Document Type: Article
Times cited : (250)

References (35)
  • 8
    • 5944258337 scopus 로고    scopus 로고
    • submitted; Abstract LB-5 45th Annual Gaseous Electronics Conf. 27-30 October, 1992, Boston, MA
    • Wendt, A E, Mahoney L J and Shohet J L 1996 J. Appl. Phys. submitted; Abstract LB-5 45th Annual Gaseous Electronics Conf. 27-30 October, 1992, Boston, MA p 166
    • (1996) J. Appl. Phys. , pp. 166
    • Wendt, A.E.1    Mahoney, L.J.2    Shohet, J.L.3
  • 25
    • 5944250307 scopus 로고    scopus 로고
    • See [23] section 10.2
    • See [23] section 10.2
  • 26
    • 5944246954 scopus 로고    scopus 로고
    • See [23] p 81
    • See [23] p 81
  • 27
    • 5944254517 scopus 로고    scopus 로고
    • See [23] section 10.3
    • See [23] section 10.3
  • 29
    • 0001398338 scopus 로고
    • Lichtenberg A J, Vahedi V, Lieberman M A and Rognlien T 1994 J. Appl. Phys. 75 2339; 1994 J. Appl. Phys. 76 625
    • (1994) J. Appl. Phys. , vol.76 , pp. 625
  • 33
    • 0030133965 scopus 로고
    • Pulse-time modulated plasma etching of etching processes for overcoming limitation
    • Samukawa S, Kinoshita K and Mieno T 1995 Pulse-time modulated plasma etching of etching processes for overcoming limitation Plasma Sources Sci. Technol. 5 132
    • (1995) Plasma Sources Sci. Technol. , vol.5 , pp. 132
    • Samukawa, S.1    Kinoshita, K.2    Mieno, T.3
  • 34
    • 5944262193 scopus 로고    scopus 로고
    • See [23] section 6.6
    • See [23] section 6.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.