Comparative experimental analysis of the a-C:H deposition processes using CH4 and C2H2 as precursors

Journal of Applied Physics

Volumn 102, Issue 5, 2007, Pages

  Peter, S ^a   Graupner, K ^a   Grambole, D ^b   Richter, F ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DEPOSITION; ELECTRODES; HARDNESS; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE ROUGHNESS;

DISPLACEMENT CURRENTS; HYDROGEN CONTENT; ION FLUX; MASS DENSITY;

THIN FILMS;

EID: 34548645464     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2777643     Document Type: Article

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