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Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 384-391

Time-resolved characterisation of pulsed magnetron discharges using Langmuir probes

(4) Richter, F a Welzel, Th a Dunger, Th a Kupfer, H a

a CHEMNITZ UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

Langmuir probe technique; Physical vapour deposition; Plasma density; Plasma processing and deposition

Indexed keywords

CARRIER CONCENTRATION; CHARACTERIZATION; CHARGE CARRIERS; MAGNESIA; MAGNETRON SPUTTERING; PLASMA DENSITY; PROBES;

ELECTRON TEMPERATURE; LANGMUIR PROBES; PULSED PLASMA DISCHARGES; TIME-RESOLVED CHARACTERIZATION;

LANGMUIR BLODGETT FILMS;

VAPOR DEPOSITION;

EID: 14644442301 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.08.030 Document Type: Article

Times cited : (15)

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