An approach to modeling particle-based and contact-based wear in CMP

Materials Research Society Symposium Proceedings

Volumn 991, Issue , 2007, Pages 183-203

  Terrell, Elon Jahdal ^a   Kuo, Michael ^a   Higgs, C Fred ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PROFILOMETRY; SILICON WAFERS; TOPOGRAPHY; WEAR OF MATERIALS;

CONTACT MECHANICS; INTERACTING CUBOIDS; POLISHING PAD; WEAR MODELING;

CHEMICAL MECHANICAL POLISHING;

EID: 38549104975     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-0991-c06-04     Document Type: Conference Paper

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