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Journal of the Electrochemical Society

Volumn 149, Issue 1, 2002, Pages

Evolution of copper-oxide damascene structures in chemical mechanical polishing: II. Copper dishing and oxide erosion

(3) Lai, Jiun Yu a Saka, Nannaji a Chun, Jung Hoon a

a USA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL POLISHING; EROSION; LITHOGRAPHY; MATHEMATICAL MODELS; PARTICLE SIZE ANALYSIS; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY;

OXIDE EROSIONS; PATTERN PLANARIZATION;

COPPER OXIDES;

EID: 0036226177 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1420708 Document Type: Article

Times cited : (24)

References (23)

1
- 0036223189
- (2002) J. Electrochem. Soc. , vol.149
- Lai, J.-Y.¹ Saka, N.² Chun, J.H.³

2
- 2942561344
- SPIE-Society of Photo-Optical Instrument Engineering
- (1997) Proceedings of SPIE Microelectronics Manufacturing Conference , pp. 236
- Ouma, D.¹ Stine, B.² Divecha, R.³ Boning, D.⁴ Chung, J.⁵ Shinn, G.⁶ Ali, I.⁷ Clark, J.⁸

3
- 0001971127
- Santa Clara, CA
- (1999) Proceedings of 4th International Conference on Chemical-Mechanical Polishing for ULSI Multilevel Interconnection CMP-MIC , pp. 93
- Smith, T.H.¹ Fang, S.J.² Boning, D.³ Shinn, G.B.⁴ Stefani, J.A.⁵

4
- 0002978729
- Santa Clara, CA
- (1999) Proceedings of 4th International Conference on Chemical-Mechanical Polishing for ULSI Multilevel Interconnection CMP-MIC , pp. 423
- Pan, J.T.¹ Li, P.² Kapila, W.³ Tsai, S.⁴ Redeker, F.⁵ Park, T.⁶ Tugbawa, T.⁷ Boning, D.⁸

5
- 0008862712
- Ph.D. Thesis, Massachusetts Institute of Technology, Cambridge, MA
- (2001)
- Lai, J.Y.¹

6
- 0026260129
- (1991) J. Electrochem. Soc. , vol.138 , pp. 3460
- Kaufman, F.B.¹ Thompson, D.B.² Broadie, R.E.³ Jaso, M.A.⁴ Guthrie, W.L.⁵ Pearson, D.J.⁶ Small, M.B.⁷

7
- 0001519648
- (1995) Mater. Chem. Phys. , vol.41 , pp. 217
- Steigerwald, J.M.¹ Murarka, S.P.² Gutmann, R.J.³ Duquette, D.J.⁴

8
- 0029389318
- (1995) Thin Solid Films , vol.266 , pp. 238
- Carpio, R.¹ Farkas, J.² Jairath, R.³

9
- 0000688858
- (1997) Microelectron. Eng. , vol.33 , pp. 259
- Zeidler, D.¹ Stavreva, Z.² Plötner, M.³ Drescher, K.⁴

10
- 17344376178
- (1997) Microelectron. Eng. , vol.37-38 , pp. 135
- Fayolle, M.¹ Romagna, F.²

11
- 0032320325
- (1998) Thin Solid Films , vol.335 , pp. 160
- Luo, Q.¹ Ramarajan, S.² Babu, S.V.³

12
- 0032050873
- (1998) J. Electrochem. Soc. , vol.145 , pp. 1285
- Van Kranenburg, H.¹ Woerlee, P.H.²

13
- 0034292727
- (2000) J. Electrochem. Soc. , vol.147 , pp. 3820
- Hariharaputhiran, M.¹ Zhang, J.² Ramarajan, S.³ Keleher, J.J.⁴ Li, Y.⁵ Babu, S.V.⁶

14
- 0034296462
- (2000) J. Electrochem. Soc. , vol.147 , pp. 3907
- Kondo, S.¹ Sakuma, N.² Homma, Y.³ Goto, Y.⁴ Ohashi, N.⁵ Yamaguchi, H.⁶ Owada, N.⁷

15
- 4243829776
- MRS Bull. , vol.1993 , pp. 46
- Murarka, S.P.¹ Steigerwald, J.² Gutmann, R.J.³

16
- 0028516105
- (1994) J. Electrochem. Soc. , vol.141 , pp. 2842
- Steigerwald, J.M.¹ Zirpoli, R.² Murarka, S.P.³ Price, D.⁴ Gutmann, R.J.⁵

17
- 0029544820
- (1995) Thin Solid Films , vol.270 , pp. 596
- Gutmann, R.J.¹ Steigerwald, J.² You, L.³ Price, D.T.⁴ Neirynck, J.⁵ Duquette, D.J.⁶ Muraka, S.P.⁷

18
- 0001760413
- (1995) Appl. Surf. Sci. , vol.91 , pp. 192
- Stavreva, Z.¹ Zeidler, D.² Plötner, M.³ Drescher, K.⁴

19
- 0000467901
- (1997) Microelectron, Eng. , vol.33 , pp. 249
- Stavreva, Z.¹ Zeidler, D.² Plötner, M.³ Grasshoff, G.⁴ Drescher, K.⁵

20
- 0000143732
- Santa Clara, CA
- (1999) Proceeding of 4th International Conferences of Chemical-Mechanical for ULSI Multilevel Interconnection (CMP-MIC) , pp. 184
- Park, T.¹ Tugbawa, T.² Boning, D.³ Chung, J.⁴ Hymes, S.⁵ Muralidhar, R.⁶ Wilks, B.⁷ Smekalin, K.⁸ Bersuker, G.⁹

21
- 0003508875
- John Wiley & Sons, Inc., New York
- (1995) Chemical Mechanical Planarization of Microelectronic Materials , pp. 258
- Steigerwald, J.M.¹ Murarka, S.P.² Gutmann, R.J.³

22
- 0032071103
- (1998) J. Electrochem. Soc. , vol.145 , pp. 1659
- Elbel, N.¹ Neureither, B.² Ebersberger, B.³ Lahnor, P.⁴

23
- 0008851416
- R. L. Opila, C. R. Simpson, K. B. Sundaram, I. Ali, Y. A. Arimoto, and Y. Homma, Editors, PV 99-37, Electrochemical Society Proceedings Series Pennington, NJ
- (1999) Chemical Mechanical Polishing IC Device Manufacturing III , pp. 605
- Tugbawa, T.¹ Park, T.² Boning, D.³ Pan, T.⁴ Hymes, S.⁵ Brown, T.⁶ Camilletti, L.⁷

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.