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Volumn 148, Issue 2, 2001, Pages

Modeling and Characterization of Tungsten Chemical and Mechanical Polishing Processes

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0002507922     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1341246     Document Type: Article
Times cited : (13)

References (13)
  • 2
    • 0348029783 scopus 로고    scopus 로고
    • S. V. Babu, S. Danyluk, M. I. Krishnan, and M. Tsujimura. Editors. p. 2.8. Materials Research Society. Warrendale, PA
    • M. R. Oliver. in Chemical Mechanical Polishing: Fundamental and Challenges. S. V. Babu, S. Danyluk, M. I. Krishnan, and M. Tsujimura. Editors. p. 2.8. Materials Research Society. Warrendale, PA (1999).
    • (1999) Chemical Mechanical Polishing: Fundamental and Challenges. , pp. 28
    • Oliver, M.R.1
  • 9
    • 0347398993 scopus 로고    scopus 로고
    • S. V. Bahu. S. Danyluk. M. I. Krishnan. and M. Tsujimura. Editors, p. 4.7. Materials Research Society. Warrendale. PA
    • S. Ramarajan and S. Babu, in Chemical Mechanical Polishing: Fundamentals and Challenges . S. V. Bahu. S. Danyluk. M. I. Krishnan. and M. Tsujimura. Editors, p. 4.7. Materials Research Society. Warrendale. PA (1999).
    • (1999) Chemical Mechanical Polishing: Fundamentals and Challenges , pp. 47
    • Ramarajan, S.1    Babu, S.2
  • 12
    • 0346768490 scopus 로고    scopus 로고
    • Fluent Inc., Lehanon NH
    • FIDAP V. 7.62. Fluent Inc., Lehanon NH (1998).
    • (1998) FIDAP V. 7.62


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.