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Volumn 150, Issue 9, 2003, Pages

A Locally Relevant Wafer-Scale Model for CMP of Silicon Dioxide

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFORMATION; SILICA; STRAIN;

EID: 0041779930     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1598967     Document Type: Article
Times cited : (11)

References (19)
  • 9
    • 0022557924 scopus 로고
    • J. I. McCool, Wear, 107, 37 (1986).
    • (1986) Wear , vol.107 , pp. 37
    • McCool, J.I.1
  • 11
    • 85040875608 scopus 로고
    • Cambridge University Press, New York
    • K. L. Johnson, Contact Mechanics, Cambridge University Press, New York (1987).
    • (1987) Contact Mechanics
    • Johnson, K.L.1
  • 12
    • 0042055799 scopus 로고    scopus 로고
    • Rodel, Inc., AVS Northern CA, CMPUG (2001)
    • A. S. Lawing and R. Rhoades, Rodel, Inc., AVS Northern CA, CMPUG (2001).
    • Lawing, A.S.1    Rhoades, R.2
  • 13
    • 0041554505 scopus 로고    scopus 로고
    • Personal communication
    • K. Cooper, Personal communication (2002).
    • (2002)
    • Cooper, K.1
  • 16
    • 0042055798 scopus 로고    scopus 로고
    • Unpublished data (2001)
    • D. Castillo, Unpublished data (2001).
    • Castillo, D.1
  • 18
    • 0041554504 scopus 로고    scopus 로고
    • MathSoft Co., Cambridge, MA
    • MathCad 7.0 User's Manual, MathSoft Co., Cambridge, MA (2000).
    • (2000) MathCad 7.0 User's Manual


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.