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Volumn 150, Issue 9, 2003, Pages
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A Locally Relevant Wafer-Scale Model for CMP of Silicon Dioxide
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
DEFORMATION;
SILICA;
STRAIN;
CONTACT PRESSURE;
SILICON WAFERS;
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EID: 0041779930
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1598967 Document Type: Article |
Times cited : (11)
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References (19)
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