A modeling approach for predicting the abrasive particle motion during chemical mechanical polishing

Journal of Tribology

Volumn 129, Issue 4, 2007, Pages 933-941

  Terrell, Elon J ^a   Higgs III, C Fred ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

Chemical mechanical polishing; Slurry particle motion; Suspension flow

Indexed keywords

ABRASIVES; COMPUTER SIMULATION; LUBRICATION; MATHEMATICAL MODELS; SUSPENSIONS (FLUIDS);

CHEMICAL MECHANICAL POLISHING (CMP); SLURRY PARTICLE MOTION;

CHEMICAL POLISHING;

ABRASIVES; CHEMICAL POLISHING; COMPUTER SIMULATION; LUBRICATION; MATHEMATICAL MODELS; SUSPENSIONS (FLUIDS);

EID: 33847706270     PISSN: 07424787     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.2768614     Document Type: Article

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