An empirical dielectric erosion formula in metal chemical mechanical planarization

Journal of the Electrochemical Society

Volumn 153, Issue 6, 2006, Pages

  Chen, Zhan ^a,b   Sun, Fred ^a   Vacassy, Robert ^a  

^a CABOT MICROELECTRONICS CORPORATION   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MECHANICAL PLANARIZATION; DIELECTRIC EROSION; EROSION PERFORMANCE; METAL LINEWIDTH;

DIELECTRIC PROPERTIES; ELECTROCHEMISTRY; EROSION; METAL FINISHING;

CHEMICAL MECHANICAL POLISHING;

EID: 33646391674     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2194765     Document Type: Article

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