Modification of the Preston equation for the chemical-mechanical polishing of copper

Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 160-167

  Luo, Q ^a,b   Ramarajan, S ^a   Babu, S V ^a  

^a Clarkson University   (United States)

^b Strasbaugh Inc   (United States)

Author keywords

Chemical mechanical polishing; Copper; Preston equation

Indexed keywords

ABRASIVES; ALUMINA; CHEMICAL MODIFICATION; CHEMICAL POLISHING; COPPER; PH EFFECTS; SLURRIES;

PRESTON EQUATION;

THIN FILMS;

EID: 0032320325     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00896-7     Document Type: Article

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