Analysis of printability of scratch defect on reflective mask in extreme ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 12, 2006, Pages 9044-9052

  Sugawara, Minora ^a,b   Nishiyama, Iwao ^a   Motai, Kumi ^a   Cullins, Jerry ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b SONY CORPORATION   (Japan)

Author keywords

Energy loss; Extreme ultraviolet lithography; Off axis incidence; Reflective mask; Scratch defect; Smoothing deposition

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; ENERGY DISSIPATION; EXTREME ULTRAVIOLET LITHOGRAPHY; SURFACE TOPOGRAPHY;

OFF-AXIS INCIDENCE; REFLECTIVE MASK; SCRATCH DEFECT; SMOOTHING DEPOSITION;

CRYSTAL DEFECTS;

EID: 34547889954     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.9044     Document Type: Article

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