Evaluation of the cleanliness of the ion-assisted Mo-Si deposition process for extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2466-2470

  Hau Riege, Stefan P ^a   Mirkarimi, Paul B ^a   Walton, Christopher C ^a   Sperry, Victor ^a   Larson, Cindy ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COMPOSITION; COMPUTATIONAL METHODS; COMPUTER SIMULATION; CRYSTALLOGRAPHY; ETCHING; FREQUENCIES; ION BEAM ASSISTED DEPOSITION; LIGHT SCATTERING; MULTILAYERS; PERTURBATION TECHNIQUES; PUMPING (LASER); SUBSTRATES; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; HIGH-SPATIAL FREQUENCY ROUGHNESS; MULTILAYER FILMS;

LITHOGRAPHY;

EID: 0942278368     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1615979     Document Type: Article

References (8)

1. J. Canning, Attendee Survey, Next Generation Lithography Workshop, International Sematech, Pasadena, CA, 28-30 August 2001.
2. P. B. Mirkarimi, E. A. Spiller, D. G. Stearns, V. Sperry, and S. L. Baker, Quant. Elect. Lett. 37, 1514 (2001).
3. P. B. Mirkarimi, E. A. Spiller, D. G. Stearns, S. L. Baker, and V. Sperry, J. Microlith. Microfab. Microsys. (in press).
4. Pentagon Technologies, Hayward, CA 94545 (http://www.pen-tec.com).
5. Detergent FL-70*, Fisher Scientific, Fair Lawn, NJ
6. P.-F. Huang, Y. S. Uristky, and C. R. Brundle, AIP Conf. Proc. 550, 317 (2001).
7. P. A. Kearney (private communication).
8. C. Walton, P. Kearney, J. Folta, D. Sweeney, and P. Mirkarimi, Proc. SPIE 5037, 470 (2003).