Impact of multi-layer deposition method on defects for EUVL photomask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Cullins, Jerry ^a,b   Motai, Kumi ^a,b   Nisiyama, Iwao ^a,b  

^a ASET ^*  (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Defects; Ion Beam; Magnetron; Mask; Multi Layer Deposition; Photomask

Indexed keywords

BUMP TYPE DEFECTS; ION BEAM SPUTTERING; MULTI-LAYER DEPOSITION; PHOTOMASKS;

CRYSTAL DEFECTS; ION BEAMS; LITHOGRAPHY; MAGNETRON SPUTTERING; MASKS; MULTILAYERS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

DEPOSITION;

EID: 33745603697     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656931     Document Type: Conference Paper

References (3)

1. th International EUVL Symposium, San Diego, California, USA, 7-9 Nov. 2005
2. nd International EUVL Symposium, Antwerp, Belgium, 30 Sept.-2 Oct. 2003
3. S. Miyagaki et al., J. Vac. Sci. and Technol. B22 (6) (2004) 3063