Progress towards the development of a commercial tool and process for EUVL mask blanks

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 168-177

  Ma, Andy ^a   Kearney, Patrick ^a   Krick, Dave ^a   Randive, Rajul ^b   Reiss, Ira ^b   Mirkarimi, Paul ^b   Spiller, Eberhard ^b  

^a SEMATECH   (United States)

^b VEECO INSTRUMENTS INC   (United States)

Author keywords

Ion beam deposition; Multilayer deposition; Reflectivity

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); ION BEAM DEPOSITION; MULTILAYER DEPOSITION; REFLECTIVE OPTICAL SYSTEM;

DEFECTS; ELECTROMAGNETIC WAVE REFLECTION; ION BEAMS; MULTILAYERS; OPTICAL COATINGS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

MASKS;

EID: 24644519359     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599936     Document Type: Conference Paper

References (6)

1. SEMI P38-1102. Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks. Nov. 2002.
2. th Annual BACUS Symposium on Photomask Technology, Proc. of SPIE, vol. W. Staud and J.T Weed, ed., vol. 5567, (2004).
3. C.C. Walton, P.A. Kearney, P.B. Mirkarimi, J.M. Bowers, C. Cerjan, A.L. Warrick, K. Wilhelmsen, E. Fought, C. Moore, C. Larson, S. Baker, and S.C. Burkhart, Extreme Ultraviolet Lithography - reflective mask technology, in Emerging Lithographic Technologies IV, E.A. Dobisz, ed., Proc. of SPIE, vol. 3997, 496-507 (2000).
4. rd Annual BACUS Symposium on Photomask Technology, K. Kimmel and W. Staud, ed., Proceedings of SPIE, vol.5256, 127-1296 (2003).
5. P.B. Mirkarimi, S.L. Baker, M.A. Wall, P.A. Kearney, and D.G. Stearns, Defects from substrate particles depend on the sputter deposition process, Solid State Technol. 43, 95-99 (2000).
6. E.A. Spiller, S.L. Baker, P.B. Mirkarimi, V. Sperry, E.M. Gullikson, and D.G. Stearns, High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition, Appl. Opt. 42, 4049-4058 (2003).