Aerial image characterization for the defects in the extreme ultraviolet mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 751-759

  Yoo, Myoung Sul ^a   Park, Seung Wook ^a   Kim, Jong Hoi ^a   Kwon, Yeong Keun ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Aerial image; EUV lithography; EUV mask; Multilayer defect

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE REFLECTION; ETCHING; EXTRUSION; LIGHT ABSORPTION; MULTILAYERS; PHOTOLITHOGRAPHY; POLISHING; ULTRAVIOLET RADIATION;

AERIAL IMAGES; EUV LITHOGRAPHY; EUV MASKS; EXTREME ULTRAVIOLET (EUV); MULTILAYER DEFECTS;

MASKS;

EID: 3843099212     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534851     Document Type: Conference Paper

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