Lithographic characterization of EUVL mask blank defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 740-750

  Hashimoto, Takeo ^a   Yamanashi, Hiromasa ^a   Sugawara, Minoru ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Aerial image; Defect; EUVL mask; Multilayer mask blank; Repair

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; ELECTRON BEAMS; FINITE DIFFERENCE METHOD; MAGNETRON SPUTTERING; MASKS; MULTILAYERS; PHASE SHIFT; TIME DOMAIN ANALYSIS; ULTRAVIOLET RADIATION;

AERIAL IMAGES; EUVL MASKS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MULTILAYER MASK BLANKS; PHASE DEFECTS;

PHOTOLITHOGRAPHY;

EID: 3843103570     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534692     Document Type: Conference Paper

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