Models for characterizing the printability of buried EUV defects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 551-558

  Deng, Y ^a   Pistor, T ^a   Neureuther, A R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Defect printability; Electromagnetic scattering; EUV lithography; Image models

Indexed keywords

COMPUTER SIMULATION; COMPUTER WORKSTATIONS; LIGHTING; MAGNETOELECTRIC EFFECTS; ULTRAVIOLET RADIATION;

DEFECT PRINTABILITY; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0034768944     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436687     Document Type: Conference Paper

References (7)

1. Investigating the growth of localized defects in thin-film using gold nanospheres
2. Simulation of EUV multi-layer mirror buffed defects
3. Extreme ultraviolet mask defect simulation low-profile defects