Extreme ultraviolet mask defect simulation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3019-3023

  Pistor, Tom ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033265197     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590946     Document Type: Article

References (10)

1. T. Pistor, K. Adam, and A. R. Neureuther, 42nd International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, Chicago, 26-29 May 1998.
2. B. S. Bollepalli, M. Khan, and F. Cerrina, J. Vac. Sci. Technol. B 16, 3444 (1998).
3. T. Pistor and A. R. Neureuther, Proc. SPIE (to be published).
4. B. S. Bollepalli and F. Cerrina, Proc. SPIE (to be published).
5. V. G. Kohn, Phys. Status Solidi B 187, 61 (1995).
6. http://www-cxro.lbl.gov/optical_constants/
7. S. J. Spector, D. L. White, D. M. Tennant, L. Ping, and O. R. Wood II, Proc. SPIE 3546, 548 (1998).
8. S. Jeong et al., J. Vac. Sci. Technol. B 16, 3430 (1998).
9. K. B. Nguyen et al., J. Vac. Sci. Technol. B 13, 3082 (1995).
10. K. B. Nguyen, A. K. Wong, A. R. Neureuther, D. T. Attwood, and T. D. Nguyen, OSA Proceedings on Soft X-Ray Projection Lithography, 1993, Vol. 18, pp. 47-53.