Investigation of defect repair methods for EUVL mask blanks through aerial-image simulations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART II, Issue , 2005, Pages 855-865

  Hashimoto, Takeo ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Aerial image; Defect; EUVL; Mask blank; Repair

Indexed keywords

DEFECTS; LITHOGRAPHY; PATTERN RECOGNITION; REPAIR;

AERIAL IMAGE; EUV LITHOGRAPHY; MASK BLANK;

IMAGING TECHNIQUES;

EID: 28544452087     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617268     Document Type: Conference Paper

References (12)

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6. TEMPESTpr is a trademark of Panoramic Technology Inc.
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12. EM-Suite is a trade mark of Panoramic Technology Inc.