Pattern printability for variation in thickness of a Mo/Si mask blank in extreme ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 1, 2003, Pages 78-85

  Sugawara, Minoru ^a   Chiba, Akira ^a   Yamanashi, Hiromasa ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Phase shift; Printability; Reflectance; Thickness variation

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; MATHEMATICAL MODELS; MOLYBDENUM; MONOLAYERS; MULTILAYERS; OPTIMIZATION; PHOTOLITHOGRAPHY; SILICON; THICKNESS MEASUREMENT;

PRINTABILITY; THICKNESS VARIATION;

MASKS;

EID: 0038682101     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.42.78     Document Type: Article

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