Analysis of asymmetry of printed image by off-axis incident light onto reflective mask in extreme ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 12, 2005, Pages 8409-8421

  Sugawara, Minoru ^a   Nishiyama, Iwao ^a   Tarai, Mikio ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Asymmetry of printed image; Extreme ultraviolet lithography; Light intensity distribution function; Off axis incidence

Indexed keywords

DIFFRACTION; EDGE DETECTION; FOURIER TRANSFORMS; LITHOGRAPHY; MASKS;

ASYMMETRY OF PRINTED IMAGES; EXTREME ULTRAVIOLET LITHOGRAPHY (EUV); LIGHT INTENSITY DISTRIBUTION FUNCTIONS; OFF-AXIS INCIDENCE;

IMAGE ANALYSIS;

EID: 31544475689     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.8409     Document Type: Article

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