Printability of opaque and clear phase-defects using the finite-difference time-domain (FDTD) method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 831-840

  Krautschik, Christof ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

CD control; Defect printability; EUV mask; FDTD; Opaque defect; Phase defect; Process window

Indexed keywords

COMPUTER SIMULATION; FINITE DIFFERENCE METHOD; IMAGE ANALYSIS; MASKS; OPACITY; TIME DOMAIN ANALYSIS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; OPAQUE; PHASE DEFECTS; PRINTABILITY;

PHOTOLITHOGRAPHY;

EID: 0141835975     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482640     Document Type: Conference Paper

References (4)

1. A. K. Ray-Chaudhur, G. Cardinale, A. Fisher, "Method of compensation of extreme-ultraviolet multilayer defects," J. Va. Sci. Technol. B 17(6), Nov/Dec. 1999.
2. Masaki Ito, Taro Ogawa, Katsura Otaki, Iwao Nishiyama, Shinji Okzaki, Tsunero Treasawa, "Simulation of Multilayer Defects in Extreme Ultraviolet Masks," Jpn. J. Appl. Phys. Vol. 40 (2001).
3. Amir Y. Abdo, Pei-Yang Yan, "Numerical Investigation of EUV Mask Contact Layer Defect Printability at the 30 nm Technology Node," SPIE Vol 4409, 2001.
4. Manhyoung Ryoo, Masa Ito, Byoung Tack Lee, Taro Ogawa, Shinji Okazaki, "Simulation of EUVL Mask Defect Printability,", SPIE, Vol 4409, 2001