A 3-D substrate and buried defect simulator for EUV mask blanks

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 455-465

  Lam, Michael C ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Buried defects; Defect inspection; Defective multilayers; EUV; EUV mask blanks; Fast simulation methods; Ray tracing

Indexed keywords

BURIED DEFECTS; DEFECT INSPECTION; DEFECTIVE MULTILAYERS; EUV MASK BLANKS; FAST SIMULATION METHODS;

APPROXIMATION THEORY; FINITE DIFFERENCE METHOD; MAGNETOELECTRIC EFFECTS; PHOTOLITHOGRAPHY; RAY TRACING; TIME DOMAIN ANALYSIS; ULTRAVIOLET RADIATION;

MASKS;

EID: 24644509193     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599042     Document Type: Conference Paper

References (9)

1. David Attwood, Soft X-Rays and Extreme Ultraviolet Radiation, (Cambridge University Press, 1999), p. 404.
2. ibid., p.404.
3. Lam, M. and A.R. Neureuther, "Fast simulation methods for defective EUV mask blank inspection." Bacus Conference, Proc. of SPIE, vol. 5567, 2004.
4. A. Wong, Rigorous Three-Dimensional Time-Domain Finite-Difference Electromagnetic Simulation, Ph.D. Dissertation, University of California at Berkeley (1994).
5. Gullikson, et al. "Practical approach for modeling extreme ultraviolet lithography mask defects." Journal of Vacuum Science & Technology B, vol.20, (no.1), 2002.
6. P.B. Mirkarimi, et al. "Investigating the growth of localized defects in thin films using gold nanospheres." Applied Physics Letters, vol. 77 (14), 2000.
7. P.B. Mirkarimi, et al. "Developing a viable multilayer coating process for extreme ultraviolet lithography reticles." JM3, vol. 3(1), pp. 139-145, Jan. 2004.
8. A.R. Neureuther, P. Flanner III and S.Shen, "Coherence of Defect Interactions with Features in Optical Imaging," J. Vac. Sci. Technol. B 5, pp.308-312, Jan/Feb 1987.
9. Watanabe H, Sugiura E, Imoriya T, Todokoro Y, Inoue M. Detection and printability of shifter defects in phase-shifting masks. II. Defocus characteristics. [Conference Paper] Japanese Journal of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, vol.31, no.12B, Dec. 1992, pp.4155-60. Japan