Simulation of multilayer defects in extreme ultraviolet masks

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 4 A, 2001, Pages 2549-2553

  Ito, Masaaki ^a   Ogawa, Taro ^a   Otaki, Katsura ^a   Nishiyama, Iwao ^a   Okazaki, Shinji ^a   Terasawa, Tsuneo ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

Defect; Extreme ultraviolet; Lithography; Mask; Multilayer

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; DEFECTS; LITHOGRAPHY; MATHEMATICAL MODELS; MULTILAYERS; ULTRAVIOLET RADIATION;

ULTRAVIOLET MASKS;

MASKS;

EID: 0035301763     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.2549     Document Type: Article

References (12)