Effect of incident angle of off-axis illumination on pattern printability in extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2701-2705

  Sugawara, Minoru ^a   Chiba, Akira ^a   Nishiyama, Iwao ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; DENSITY (OPTICAL); IMAGE ANALYSIS; INTEGRAL EQUATIONS; MASKS; MATHEMATICAL MODELS; MAXWELL EQUATIONS; MONOLAYERS; PATTERN RECOGNITION; TIME DOMAIN ANALYSIS;

AERIAL IMAGES; ULTRAVIOLET LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0942289236     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.162426410.1116/1.1624264     Document Type: Article

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