Microstructure of SiO2/TiO2 Coatings and Their Use in Graded-Index Optical Filters

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2003, Pages 334-338

  Larouche, S ^a   Szymanowski, H ^a   Amassian, A ^a   Klemberg Sapieha, J E ^a   Martinu, L ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Graded index optical filters; Plasma enhanced chemical vapor deposition (PECVD); Real time in situ monitoring; Silica titania mixtures

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROSTRUCTURE; OPTICAL FILTERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

RUGATE FILTERS;

SILICA;

EID: 0242385294     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)

1. B. G. Bovard, "Rugate filter theory: an overview," Appl. Opt., 32 (28), 5427, 1993.
2. M.-A. Raymond, S. Larouche, O. Zabeida, L. Martinu, and J. E. Klemberg-Sapieha, "Tribological properties of PECVD optical coatings, " 44th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 301, Philadelphia, 2001.
3. L. Martinu and D. Poitras, "Plasma deposition of optical films and coatings: a review," J. Vac. Sci. Technol., A18 (6), 2619, 2000.
4. S. Larouche, A. Amassian, S. C. Gujrathi, J. E. Klemberg-Sapieha, and L. Martinu, "Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide," 44th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 277, Philadelphia, 2001.
5. B. Johs, J. Hale, N. J. Ianno, C. M. Herzinger, T. Tiwald, and J. A. Woollam, "Recent developments in spectroscopic ellipsometry for in situ applications," Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, SPIE vol. 4449, 41, 2001.
6. 2 deposited by PECVD," 45th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, p. 250, Orlando, 2002.
7. L. Martinu, J. E. Klemberg-Sapieha, O. M. Kuttel, A. Raveh, and M. R. Wertheimer, "Critical ion energy and ion flux in the growth of films by plasma-enhanced chemical vapor deposition," J. Vac. Sci. Technol., A12 (4), 1360, 1994.
8. x films produced by plasma enhanced chemical vapor deposition," J. Vac. Sci. Technol., A14 (3), 689, 1986.
9. N. C. da Cruz, E. C. Rangel, J. Wang, B. C. Trasferetti, C. U. Davanzo, S. G. C. Castro, and M. A. B. de Boraes, "Properties of titanium oxide films obtained by PECVD," Surf. Coat. Technol., 126, 123, 2000.
10. G. Ricchiardi, A. Damin, S. Bordiga, C. Lamberti, G. Spanò, F. Rivetti, and A. Zecchina, "Vibrational structure of titanium silicate catalyst, a spectroscopic and theoretical study," J. Am. Chem. Soc., 123, 11409, 2001.
11. J. F. Moulder, W. F. Stickle, P. E. Sobol, K. D. Bomben, and J. Chastain, eds, Handbook of X-Ray Photoelectron Spectroscopy, 1992.
12. T. L. Barr, "Recent advances in x-ray photoelectron spectroscopy studies of oxides," J. Vac. Sci. Technol., A9 (3), 1793, 1991.
13. L.-J. Meng, C. P. Moreira de Sa, and M. P. dos Santos, "Study of porosity of titanium oxide films by X-ray photoelectron spectroscopy and IR transmittance," Thin Solid Films, 239, 117, 1994.