Surface processes during thin-film growth

Plasma Sources Science and Technology

Volumn 9, Issue 4, 2000, Pages 455-467

  Von Keudell, Achim ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; DEPOSITION; FILM GROWTH; PLASMA INTERACTIONS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; THIN FILMS;

SYNERGISTIC EFFECT;

PLASMA APPLICATIONS;

EID: 0034320014     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/4/302     Document Type: Article

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