Interface engineering during plasma-enhanced chemical vapor deposition of porous/dense SiN1.3 optical multilayers

Thin Solid Films

Volumn 469-470, Issue SPEC. ISS., 2004, Pages 47-53

  Amassian, A ^a   Vernhes, R ^a   Klemberg Sapieha, J E ^a   Desjardins, P ^a   Martinu, L ^a,b  

^a Station Centre Ville ^*  (Canada)

^b ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Ellipsometry; Optical coatings; Plasma processing and deposition; Silicon nitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FILM GROWTH; INTERFACES (MATERIALS); ION BOMBARDMENT; OPTICAL COATINGS; OPTICAL FILTERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS SILICON; REFRACTIVE INDEX; SILICA; SILICON NITRIDE; SURFACE ROUGHNESS;

INTERFACE ENGINEERING; PLASMA PROCESSING AND DEPOSITION; SURFACE OVERLAYER (SO);

OPTICAL MULTILAYERS;

EID: 10044266472     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.07.072     Document Type: Article

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