An Introduction to Plasma Etching for VLSI Circuit Technology

Bell Labs Technical Journal

Volumn 4, Issue 3, 1999, Pages 155-171

  Layadi, Nace ^a,b,c,d,e,f   Colonell, Jennifer I ^e,g   Lee, John Tseng Chung ^e,h  

^a NOKIA RESEARCH CENTER   (United States)

^b UNIVERSITÉ PARIS SACLAY   (France)

^c ECOLE POLYTECHNIQUE   (France)

^d LABORATOIRE DES SCIENCES DU CLIMAT ET DE L ENVIRONNEMENT   (France)

^e LUCENT TECHNOLOGIES   (United States)

^f 60 Woodlands Industrial Park D   (Singapore)

^g Department of Obstetrics Gynecology   (United States)

^h MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0006366515     PISSN: 10897089     EISSN: None     Source Type: Journal    
DOI: 10.1002/bltj.2184     Document Type: Article

References (12)

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2. V. M. Donnelly, "Ion Etching and Plasma Etching of Silicon," Encyclopedia of Advanced Materials, edited by D. Bloor, R. J. Brook, M. C. Flemings, and S. Mahajan, Pergamon Press, Oxford, 1994, pp. 1156-1166.
3. D. L. Flamm, V. M. Donnelly, and D. E. Ibbotson, "Basic Principles of Plasma Etching for Silicon Devices," VLSI Electronics: Microstructure Science, Vol. 8, Plasma Processing for VLSI, edited by N. G. Einspruch and D. M. Brown, Academic Press, Orlando, Florida, 1984, pp. 189-251.
4. J. W. Coburn, Plasma Etching and Reactive Ion Etching, AVS Monograph Series, M-4, American Vacuum Society, New York, 1982.
5. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, Wiley, New York, 1994.
6. B. N. Chapman, Glow Discharge Processes: Sputtering and Plasma Etching, Wiley, New York, 1980.
7. M. A. Lieberman and R. A. Gottscho, "Design of High-Density Plasma Sources for Materials Processing," Physics of Thin Films: Advances in Research and Development, Vol. 18, Plasma Sources for Thin Film Deposition and Etching, edited by M. H. Francombe and J. Vossen, Academic Press, San Diego, California, 1994, pp. 1-119.
8. O. A. Popov, ed., High Density Plasma Sources, Noyes Publications, Park Ridge, New Jersey, 1995.
9. S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era: Vol. 1, Process Technology, and Vol. 2, Process Integration, Lattice Press, Sunset Beach, California, 1986.
10. nd Edition, McGraw-Hill, New York, 1990.
11. S. M. Sze, VLSI Technology, McGraw-Hill, New York, 1983.
12. nd International Symposium on Plasma Process-Induced Damage, Northern California Chapter of the American Vacuum Society, Sunnyvale, California, 1997.