Ion-surface interactions on c-Si(001) at the radiofrequency-powered electrode in low-pressure plasmas: Ex situ spectroscopic ellipsometry and Monte Carlo simulation study

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 1, 2006, Pages 45-54

  Amassian, A ^a   Desjardins, P ^a   Martinu, L ^a  

^a Station Centre Ville ^*  (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MONTE CARLO METHODS; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS;

DEFECTIVE INTERFACIAL LAYERS (DL); ION-SURFACE INTERACTIONS; VARIABLE-ANGLE SPECTROSCOPIC ELLIPSOMETRY (VASE);

SILICON;

EID: 29344435799     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2134709     Document Type: Article

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