Ion implantation of semiconductors

Materials Science and Engineering: A

Volumn 253, Issue 1-2, 1998, Pages 8-15

  Williams, J S ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Compound semiconductors; Ion implantation; Radiation damage; Semiconductors; Silicon processing

Indexed keywords

COMPOUND SEMICONDUCTORS; ION BEAM MODIFICATION; RESIDUAL IMPLANTATION INDUCED DEFECTS; SILICON PROCESSING;

ANNEALING; CRYSTAL DEFECTS; ION BOMBARDMENT; IRRADIATION; RADIATION DAMAGE; SEMICONDUCTING SILICON; SEMICONDUCTOR MATERIALS; TEMPERATURE;

ION IMPLANTATION;

EID: 0002490765     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5093(98)00705-9     Document Type: Article

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