Focused-ion-beam-assisted etching of diamond in XeF2

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2506-2510

  Taniguchi, Jun ^a   Ohno, Naoto ^a   Takeda, Shuuichi ^b   Miyamoto, Iwao ^a   Komuro, Masanori ^c  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b KOMATSU LTD   (Japan)

^c ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000166405     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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6. T. Kuroda, Kesshyo hyomen no kisobussei (Surface and Crystal Characteristics) (Nikkan Kogyo Shinbunsha, Tokyo, 1993), pp. 43-55 (in Japanese).
7. M. Itoh and H. Kawarada, Jpn. J. Appl. Phys., Part 1 34, 4677 (1995).