Batch fabricated scanning near field optical microscope/atomic force microscopy microprobe integrated with piezoresistive cantilever beam with highly reproducible focused ion beam micromachined aperture

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 16-21

  Grabiec, P ^a   Radojewski, J ^b   Zaborowski, M ^a   Domanski, K ^a   Schenkel, T ^c   Rangelow, I W ^d  

^a Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

^b WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d UNIVERSITY OF KASSEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; ION BEAMS; LIGHT POLARIZATION; MICROMACHINING; NANOTECHNOLOGY; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL SENSORS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SIGNAL DETECTION; SIGNAL TO NOISE RATIO;

FOCUSED ION BEAMS (FIB); OPTICAL QUALITY; OPTICAL WAVELENGTHS; PIEZORESISTIVE CANTLEVER BEAMS;

MICROELECTRONICS;

EID: 1642349989     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1633280     Document Type: Conference Paper

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