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Volumn 1, Issue 6, 2005, Pages 594-608

Recent developments in nanofabrication using ion projection lithography

(1) Tseng, Ampere A a

a AZ 85281 (United States)

Author keywords

Ion sources; Nanofabrication; Nanolithography; Nanostryctures; Resists

Indexed keywords

ION SOURCES; IONS; MASKS; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR DEVICE MANUFACTURE;

ION PROJECTION LITHOGRAPHY (IPL); NEXT-GENERATION LITHOGRAPHY (NGL); RESISTS; SEMICONDUCTOR INDUSTRY;

LITHOGRAPHY;

ION; NANOMATERIAL; SILICON;

CHEMISTRY; ELASTICITY; EQUIPMENT DESIGN; INSTRUMENTATION; MAGNETISM; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; REVIEW; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; SURFACE PROPERTY;

ELASTICITY; EQUIPMENT DESIGN; IONS; MAGNETICS; MATERIALS TESTING; MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SEMICONDUCTORS; SILICON; SURFACE PROPERTIES;

EID: 33644881555 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200500050 Document Type: Article

Times cited : (40)

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