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Volumn 1, Issue 6, 2005, Pages 594-608

Recent developments in nanofabrication using ion projection lithography

Author keywords

Ion sources; Nanofabrication; Nanolithography; Nanostryctures; Resists

Indexed keywords

ION SOURCES; IONS; MASKS; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33644881555     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200500050     Document Type: Article
Times cited : (40)

References (51)
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    • 0006807833 scopus 로고
    • Henley Publishing, London
    • R. Mohondro, Semiconductor Fabtech, Issue No. 3, Henley Publishing, London, 1995, pp. 177-183.
    • (1995) Semiconductor Fabtech , Issue.3 , pp. 177-183
    • Mohondro, R.1
  • 3
    • 84875460155 scopus 로고    scopus 로고
    • International technology roadmap for semiconductors
    • SEMATECH 2004, "International Technology Roadmap for Semiconductors" in http://public.itrs.net/Files/2003ITRS/Home2003.htm.
    • SEMATECH 2004
  • 5
    • 0026838171 scopus 로고
    • U.S. Tandon, Vacuum 1992, 43, 241-251.
    • (1992) Vacuum , vol.43 , pp. 241-251
    • Tandon, U.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.