Comparison of FIB-induced physical and chemical etching

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 820-823

  Park, Y K ^a   Paszti, F ^a   Takai, M ^a   Lehrer, C ^a   Frey, L ^a   Ryssel, H ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; CRYSTAL ATOMIC STRUCTURE; CRYSTAL IMPURITIES; ETCHING; IODINE; ION BEAMS; ION IMPLANTATION; SEMICONDUCTING GALLIUM; SPUTTERING;

FOCUSED ION BEAMS (FIB); SOFTWARE PACKAGE TRIDYN;

SEMICONDUCTING SILICON;

EID: 0033313533     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)