Focused ion beam methods of nanofabrication: Room at the bottom

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4510, Issue , 2001, Pages 96-106

  Gerlach, Robert ^a   Utlaut, M ^a,b  

^a Thermo Fisher Scientific   (United States)

^b UNIVERSITY OF PORTLAND   (United States)

Author keywords

FIB; Focused ion beam; Nanofabrication

Indexed keywords

DEPOSITION; ION IMPLANTATION; LITHOGRAPHY; NANOTECHNOLOGY; NUCLEATION; REACTIVE ION ETCHING; THIN FILMS;

ION RESIST LITHOGRAPHY;

ION BEAMS;

EID: 0035766920     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.451270     Document Type: Article

References (18)

1. Richard P. Feynman, "There's Plenty of Room at the Bottom", a lecture given on Dec. 29, 1959, at the annual meeting of the American Physical Society, and first published in the Feb. 1960 issue of Caltech's, Engineering and Science. This paper can be found at http://nano.xerox.com/nanotech/feynman.html.
2. H. Ximen, R.K. DeFreez, J.Orloff, R.A. Elliott, G.A. Evans, N.W. Carlson, M. Lurie, and D.P. Bour, "Focused ion beam micromachined three-dimensional features by means of a digital scan", J. Vac. Sci. Technol. B 8 (6), pp. 1361-1365, American Vacuum Society, 1990.
3. Kenji Gamo and Susumu Namba, "Ion beam assisted etching and deposition", J. Vac. Sci. Technol. B 8 (6), pp. 1927-1931, American Vacuum Society, 1990.
4. 2O enhanced focused ion beam micromachining", J. Vac. Sci. and Technol. B 13 (6), pp. 2565-2569, American Vacuum Society, 1990.
5. Ka-Ngo Leung, "Plasma Sources for Electron and Ion Beams", J. Vac. Sci. Technol. B 17 (6), pp. 2776-2778, 1999.
6. L. Scipioni, D. Stewart, D. Ferranti, and A. Saxonis, "Performance of multicusp plasma ion source for focused ion beam applications", J. Vac. Sci. Technol. B 18 (6), pp. 3194-3197, 2000.
7. Masanori Komuro, Hiroshi Hiroshima, Hisao Tanoue, and Toshihiko Kanayama, "Maskless etching of nanometer structure by focused ion beams", J. Vac. Sci. Technol. B 1 (4), pp. 985-989, American Vacuum Society, 1983.
8. P.H. La Marche, R. Levi-Setti, and Y.L. Wang, "Focused ion beam microlithography using an etch-stop process in gallium-doped silicon", J. Vac. Sci. Technol. B 1 (4), pp. 1056-1058, American Vacuum Society, 1983.
9. J.M. Frank Zachariasse and John F. Walker, "Direct write patterning of titanium films using focused ion beam implantation and plasma etching", Microelectronic Engineering, 35, pp. 66-66, Elsevier, 1997.
10. Shinji Nagamachi, Yasuhiro Yamakage, Hiromasa Maruno, Masahiro Ueda, Seji Sugimoto, and Masatoshi Asari, Junzo Ishikawa, "Focused ion beam direct deposition of gold", Appl. Phys. Lett. 62 (17), pp. 2143-2145, American Institute of Physics, 1993.
11. L.R. Harriott and M.J. Vasile, "Focused ion beam induced deposition of opaque carbon films", J. Vac. Sci. and Technol. B 6 (3), PP. 1035-1038, American Vacuum Society, 1988.
12. Patricia G. Blauner, Yousaf Butt, JaeSang Ro, Carl V. Thompson, and John Melngailis, "Focused ion beam induced deposition of low-resistivity gold films", J. Vac. Sci. and Technol. B 7 (6), pp. 1816-1818, American Vacuum Society, 1989.
13. J. Puretz and L.W. Swanson, "Focused ion beam deposition of Pt containing films", J. Vac. Sci. and Technol. B 10 (6), pp. 2695-2698, American Vacuum Society, 1992.
14. Clive Chandler, "Method for device editing", US Patent #6211527, Issued April 3, 2001.
15. R.L. Kubena, F.P. Stratton, and T.M. Mayer, "Selective area nucleation for metal chemical vapor deposition using focused ion beams", J. Vac. Sci. and Technol. B 6 (6), pp. 1865-1868, American Vacuum Society, 1988.
16. A.R. Kirkpatrick and B.W. Ward, "Control of diamond film microstructure by use of seeded focused ion beam crater arrays", J. Vac. Sci. and Technol. B 9 (6), pp. 3095-3098, American Vacuum Society, 1991.
17. D.M. Tanenbaum, A. Olkhovets, and L. Sekaric, "Dual Exposure Glass Layer Suspended Structures (DEGLaSS): A simplified fabrication process for suspended nanostructures on planar substrates", J. Vac. Sci. and Technol. B ? (6), American Vacuum Society, 2001, to be published.
18. Brian Miller, Randall Lee, Douglas Hahn, Greg Brown, and Amy Zahler," Focused ion beam production micromachining of magnetic head write poles", Journal of the Electrochemical Society, to be published.