Silicon fine structure formation on sapphire with Focused Ion Beam

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 1101-1104

  Bai, D J ^a   Zhang, Y Q ^a   Matsushita, A ^a   Baba, A ^a   Kenjo, A ^a   Sadoh, T ^a   Nakashima, H ^a   Mori, H ^a   Tsurushima, T ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ETCHING; ION BEAMS; ION BOMBARDMENT; ION IMPLANTATION; SAPPHIRE; SEMICONDUCTING SILICON; SOLUTIONS;

FOCUSED ION BEAMS (FIB);

SEMICONDUCTING FILMS;

EID: 0033355886     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)