Improvement of focused ion-beam optics in single-ion implantation for higher aiming precision of one-by-one doping of impurity atoms into nano-scale semiconductor devices

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 3 A, 2002, Pages

  Shinada, Takahiro ^a   Koyama, Hikaru ^a   Hinoshita, Chie ^a   Imamura, Ken ^a   Ohdomari, Iwao ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

Channel doping; Chopping; Focused ion beam; One by one doping; Single ion implantation

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION BEAMS; LENSES; MICROOPTICS; NANOTECHNOLOGY; SEMICONDUCTOR DOPING;

FOCUSED ION-BEAMS (FIB); SCANNING ION MICROSCOPES (SIM);

ION IMPLANTATION;

EID: 0036508930     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l287     Document Type: Article

References (9)