-
2
-
-
0022865689
-
60Co and 10 keV X-ray damage in MOS devices
-
Dec.
-
60Co and 10 keV X-ray damage in MOS devices," IEEE Trans. Nucl. Sci., vol. NS-33, no. 6, p. 131, Dec. 1986.
-
(1986)
IEEE Trans. Nucl. Sci.
, vol.NS-33
, Issue.6
, pp. 131
-
-
Benedetto, J.M.1
Boesch, H.E.2
-
4
-
-
36149016302
-
Initial recombination of ions
-
L. Osanger, "Initial recombination of ions," Phys. Rev., vol. 54, p. 554, 1938.
-
(1938)
Phys. Rev.
, vol.54
, pp. 554
-
-
Osanger, L.1
-
5
-
-
0024169251
-
Reversibility of trapped hole charge
-
Dec.
-
A. J. Lelis, H. E. Boesch Jr., T. R. Oldham, and F. B. McLean, "Reversibility of trapped hole charge," IEEE Trans. Nucl. Sci., vol. 35, no. 6, pp. 1186-1191, Dec. 1988.
-
(1988)
IEEE Trans. Nucl. Sci.
, vol.35
, Issue.6
, pp. 1186-1191
-
-
Lelis, A.J.1
Boesch Jr., H.E.2
Oldham, T.R.3
McLean, F.B.4
-
6
-
-
0024913722
-
The nature of the trapped hole annealing process
-
Dec.
-
A. J. Lelis, T. R. Oldham, H. E. Boesch Jr., and F. B. McLean, "The nature of the trapped hole annealing process," IEEE Trans. Nucl. Sci., vol. 36, no. 6, pp. 1808-1815, Dec. 1989.
-
(1989)
IEEE Trans. Nucl. Sci.
, vol.36
, Issue.6
, pp. 1808-1815
-
-
Lelis, A.J.1
Oldham, T.R.2
Boesch Jr., H.E.3
McLean, F.B.4
-
7
-
-
0035723157
-
2 interface
-
Dec.
-
2 interface," IEEE Trans. Nucl. Sci., vol. 48, no. 6, pp. 2086-2092, Dec. 2001.
-
(2001)
IEEE Trans. Nucl. Sci.
, vol.48
, Issue.6
, pp. 2086-2092
-
-
Raskeev, S.N.1
Fleetwood, D.M.2
Scrimpf, R.D.3
Pantelides, T.4
-
8
-
-
0032306849
-
Radiation-induced leakage current and stress induced leakage current in ultra-thin gate oxides
-
Dec.
-
M. Ceschia, A. Paccagnella, A. Cester, A. Scarpa, and G. Ghidini, "Radiation-induced leakage current and stress induced leakage current in ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 45, no. 6, pp. 2375-2382, Dec. 1998.
-
(1998)
IEEE Trans. Nucl. Sci.
, vol.45
, Issue.6
, pp. 2375-2382
-
-
Ceschia, M.1
Paccagnella, A.2
Cester, A.3
Scarpa, A.4
Ghidini, G.5
-
9
-
-
0033312210
-
A model of radiation induced leakage current (RILC) in ultra-thin gate oxides
-
Dec.
-
L. Larcher, A. Paccagnella, M. Ceschia, and G. Ghidini, "A model of radiation induced leakage current (RILC) in ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 46, no. 6, pp. 1553-1561, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, Issue.6
, pp. 1553-1561
-
-
Larcher, L.1
Paccagnella, A.2
Ceschia, M.3
Ghidini, G.4
-
10
-
-
0033080327
-
A new I-V model for stress-induced leakage current including inelastic tunneling
-
Feb.
-
S. Takagi, N. Yasuda, and A. Toriumi, "A new I-V model for stress-induced leakage current including inelastic tunneling," IEEE Trans. Electron Devices, vol. 46, no. 2, pp. 348-354, Feb. 1999.
-
(1999)
IEEE Trans. Electron Devices
, vol.46
, Issue.2
, pp. 348-354
-
-
Takagi, S.1
Yasuda, N.2
Toriumi, A.3
-
11
-
-
0035723155
-
A new physics-based model for understanding single event gate rupture in linear devices
-
Dec.
-
N. Boruta, G. K. Lum, H. O'Donnell, L. Robinette, M. R. Shaneyfelt, and J. R. Schwank, "A new physics-based model for understanding single event gate rupture in linear devices," IEEE Trans, Nucl. Sci., vol. 48, no. 6, pp. 1917-1934, Dec. 2001.
-
(2001)
IEEE Trans, Nucl. Sci.
, vol.48
, Issue.6
, pp. 1917-1934
-
-
Boruta, N.1
Lum, G.K.2
O'Donnell, H.3
Robinette, L.4
Shaneyfelt, M.R.5
Schwank, J.R.6
-
12
-
-
85008043223
-
Thin oxide degradation after high-energy ion irradiation
-
Oct.
-
A. Candelori, M. Ceschia, A. Paccagnella, J. Wyss, D. Bisello, and G. Ghidini, "Thin oxide degradation after high-energy ion irradiation," IEEE Trans. Nucl. Sci., vol. 48, no. 5, pp. 1735-1743, Oct. 2001.
-
(2001)
IEEE Trans. Nucl. Sci.
, vol.48
, Issue.5
, pp. 1735-1743
-
-
Candelori, A.1
Ceschia, M.2
Paccagnella, A.3
Wyss, J.4
Bisello, D.5
Ghidini, G.6
-
13
-
-
0004038844
-
-
Norwell, MA: Kluwer
-
P. Cappelletti, C. Golla, P. Olivo, and E. Zanoni, Flash Memories. Norwell, MA: Kluwer, 2000.
-
(2000)
Flash Memories
-
-
Cappelletti, P.1
Golla, C.2
Olivo, P.3
Zanoni, E.4
-
15
-
-
0031212918
-
Flash memory cells - An overview
-
Aug.
-
P. Pavan, R. Bez, P. Olivo, and E. Zanoni, "Flash memory cells - An overview," Proc. IEEE, vol. 85, no. 8, pp. 1248-1271, Aug. 1997.
-
(1997)
Proc. IEEE
, vol.85
, Issue.8
, pp. 1248-1271
-
-
Pavan, P.1
Bez, R.2
Olivo, P.3
Zanoni, E.4
-
16
-
-
0032291504
-
Total ionizing dose effects on flash memories
-
Newport Beach, CA
-
D. N. Nguyen, C. I. Lee, and A. H. Johnston, "Total ionizing dose effects on flash memories," in Proc. IEEE Radiation Effect Data Workshop, Newport Beach, CA, 1998, pp. 100-103.
-
(1998)
Proc. IEEE Radiation Effect Data Workshop
, pp. 100-103
-
-
Nguyen, D.N.1
Lee, C.I.2
Johnston, A.H.3
-
17
-
-
0034506156
-
SEU and TID testing of the Samsung 128 Mbit and the Toshiba 256 Mbit flash memory
-
Reno, NV
-
D. R. Roth, J. D. Kinninson, B. G. Karlhuff, L. R. Lander, G. S. Bognaski, K. Chao, and G. M. Swift, "SEU and TID testing of the Samsung 128 Mbit and the Toshiba 256 Mbit flash memory," in Proc. IEEE Radiation Effect Data Workshop, Reno, NV, 2000, pp. 96-99.
-
(2000)
Proc. IEEE Radiation Effect Data Workshop
, pp. 96-99
-
-
Roth, D.R.1
Kinninson, J.D.2
Karlhuff, B.G.3
Lander, L.R.4
Bognaski, G.S.5
Chao, K.6
Swift, G.M.7
-
18
-
-
0033306963
-
Radiation effects on advanced flash memories
-
Dec.
-
D. N. Nguyen, S. M. Guertin, G. M. Swift, and A. H. Johnston, "Radiation effects on advanced flash memories," IEEE Trans. Nucl. Sci., vol. 46, no. 6, pp. 1744-1750, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci.
, vol.46
, Issue.6
, pp. 1744-1750
-
-
Nguyen, D.N.1
Guertin, S.M.2
Swift, G.M.3
Johnston, A.H.4
-
19
-
-
0031357739
-
Single-event upset in flash memories
-
Dec.
-
H. R. Schwartz, D. K. Nichols, and A. H. Johnston, "Single-event upset in flash memories," IEEE Trans. Nucl. Sci., vol. 44, no. 6, pp. 2315-2324, Dec. 1997.
-
(1997)
IEEE Trans. Nucl. Sci.
, vol.44
, Issue.6
, pp. 2315-2324
-
-
Schwartz, H.R.1
Nichols, D.K.2
Johnston, A.H.3
-
20
-
-
0036948062
-
Anomalous charge loss from floating-gate memory cells due to heavy ions irradiation
-
Dec.
-
G. Cellere, A. Paccagnella, L. Larcher, A. Chimenton, J. Wyss, A. Candelori, and A. Modelli, "Anomalous charge loss from floating-gate memory cells due to heavy ions irradiation," IEEE Trans. Nucl. Sci., vol. 49, no. 6, pp. 3051-3058, Dec. 2002.
-
(2002)
IEEE Trans. Nucl. Sci.
, vol.49
, Issue.6
, pp. 3051-3058
-
-
Cellere, G.1
Paccagnella, A.2
Larcher, L.3
Chimenton, A.4
Wyss, J.5
Candelori, A.6
Modelli, A.7
-
21
-
-
1242265231
-
Data retention after heavy ion exposure of Floating Gate memories: Analysis and simulation
-
Dec.
-
L. Larcher, G. Cellere, A. Paccagnella, A. Chimenton, A. Candelori, and A. Modelli, "Data retention after heavy ion exposure of Floating Gate memories: Analysis and simulation," IEEE Trans. Nucl. Sci., vol. 50, no. 6, pp. 2176-2183, Dec. 2003.
-
(2003)
IEEE Trans. Nucl. Sci.
, vol.50
, Issue.6
, pp. 2176-2183
-
-
Larcher, L.1
Cellere, G.2
Paccagnella, A.3
Chimenton, A.4
Candelori, A.5
Modelli, A.6
-
22
-
-
0035925937
-
SIRAD: An irradiation facility at the LNL Tandem accelerator for radiation damage studies on semiconductors detectors and electronic devices and systems
-
J. Wyss, D. Bisello, and D. Pantano, "SIRAD: An irradiation facility at the LNL Tandem accelerator for radiation damage studies on semiconductors detectors and electronic devices and systems," Nucl. Instrum. Methods Phys. Res. A, vol. A462, pp. 426-434, 2001.
-
(2001)
Nucl. Instrum. Methods Phys. Res. A
, vol.A462
, pp. 426-434
-
-
Wyss, J.1
Bisello, D.2
Pantano, D.3
-
23
-
-
0035722077
-
Radiation effects on floating-gate memory cells
-
Dec.
-
G. Cellere, P. Pellati, A. Chimenton, A. Modelli, L. Larcher, J. Wyss, and A. Paccagnella, "Radiation effects on floating-gate memory cells, " IEEE Trans. Nucl. Sci., vol. 48, no. 6, pp. 2222-2228, Dec. 2001.
-
(2001)
IEEE Trans. Nucl. Sci.
, vol.48
, Issue.6
, pp. 2222-2228
-
-
Cellere, G.1
Pellati, P.2
Chimenton, A.3
Modelli, A.4
Larcher, L.5
Wyss, J.6
Paccagnella, A.7
-
24
-
-
11044226028
-
2 layers
-
Dec.
-
2 layers," IEEE Trans. Nucl. Sci., vol. 6, no. 49, pp. 3304-3311, Dec. 2004.
-
(2004)
IEEE Trans. Nucl. Sci.
, vol.6
, Issue.49
, pp. 3304-3311
-
-
Cellere, G.1
Paccagnella, A.2
Visconti, A.3
Bonanomi, M.4
Candelori, A.5
-
25
-
-
0035248925
-
A model of stress induced leakage current in gate oxides
-
Feb.
-
L. Larcher, A. Paccagnella, and G. Ghidini, "A model of stress induced leakage current in gate oxides," IEEE Trans. Electron Devices, vol. 48, no. 2, pp. 285-288, Feb. 2001.
-
(2001)
IEEE Trans. Electron Devices
, vol.48
, Issue.2
, pp. 285-288
-
-
Larcher, L.1
Paccagnella, A.2
Ghidini, G.3
-
26
-
-
0001560218
-
Track formation in SiO2 quartz and the thermal-spike mechanism
-
May
-
A. Meftah, F. Brisard, J. M. Costantini, E. Dooryhee, M. Hage-Ali, H. Herviu, J. P. Stoquert, F. Studer, and M. Toulemonde, "Track formation in SiO2 quartz and the thermal-spike mechanism," Phys. Rev. B, vol. 49, no. 18, pp. 12457-12463, May 1994.
-
(1994)
Phys. Rev. B
, vol.49
, Issue.18
, pp. 12457-12463
-
-
Meftah, A.1
Brisard, F.2
Costantini, J.M.3
Dooryhee, E.4
Hage-Ali, M.5
Herviu, H.6
Stoquert, J.P.7
Studer, F.8
Toulemonde, M.9
-
27
-
-
0000110093
-
Transient thermal process after a high energy heavy ion irradiation of amorphous metals and semiconductors
-
Dec.
-
M. Toulemonde, C. Dufour, and E. Paumier, "Transient thermal process after a high energy heavy ion irradiation of amorphous metals and semiconductors," Phys. Rev. B, vol. 46, no. 22, pp. 14 362-14 369, Dec. 1992.
-
(1992)
Phys. Rev. B
, vol.46
, Issue.22
, pp. 14362-14369
-
-
Toulemonde, M.1
Dufour, C.2
Paumier, E.3
-
28
-
-
0001291950
-
2 interface with molecular hydrogen: Simultaneous action of passivation and dissociation
-
2 interface with molecular hydrogen: Simultaneous action of passivation and dissociation," J. Appl. Phys., vol. 88, pp. 489-497, 2000.
-
(2000)
J. Appl. Phys.
, vol.88
, pp. 489-497
-
-
Stesman, A.1
-
29
-
-
0001660285
-
Stress induced leakage current (SILC) and oxide breakdown: Are they from the same oxide traps?
-
Jun.
-
L. Pantisano and K. P. Cheung, "Stress induced leakage current (SILC) and oxide breakdown: Are they from the same oxide traps?," IEEE Trans. Device Mater. Reliab, vol. 1, no. 2, pp. 109-112, Jun. 2001.
-
(2001)
IEEE Trans. Device Mater. Reliab
, vol.1
, Issue.2
, pp. 109-112
-
-
Pantisano, L.1
Cheung, K.P.2
-
30
-
-
0032083621
-
Reversibility of charge trapping and SILC creation in thin oxides after stress/anneal cycles
-
P. Riess, R. Kies, G. Ghibaudo, and J. Brini, "Reversibility of charge trapping and SILC creation in thin oxides after stress/anneal cycles," Microelectron. Reliab, vol. 38, pp. 1057-1061, 1998.
-
(1998)
Microelectron. Reliab
, vol.38
, pp. 1057-1061
-
-
Riess, P.1
Kies, R.2
Ghibaudo, G.3
Brini, J.4
-
31
-
-
0023290486
-
The effect of hydrogen on trap generation, positive charge trapping, and time-dependent dielectric breakdown of gate oxides
-
Jun.
-
Y. Nissan-Cohen and T. Gorczyca, "The effect of hydrogen on trap generation, positive charge trapping, and time-dependent dielectric breakdown of gate oxides," IEEE Electron Device Lett., vol. 9, no. 6, pp. 287-290, Jun. 1998.
-
(1998)
IEEE Electron Device Lett.
, vol.9
, Issue.6
, pp. 287-290
-
-
Nissan-Cohen, Y.1
Gorczyca, T.2
-
32
-
-
0037406947
-
A model of radiation effects on nitride-oxide films for power MOSFET applications
-
V. A. K. Raparla, S. C. Lee, R. D. Scrimpf, D. M. Fleetwood, and K. F. Galloway, "A model of radiation effects on nitride-oxide films for power MOSFET applications," Solid State Electron., vol. 47, pp. 775-783, 2003.
-
(2003)
Solid State Electron.
, vol.47
, pp. 775-783
-
-
Raparla, V.A.K.1
Lee, S.C.2
Scrimpf, R.D.3
Fleetwood, D.M.4
Galloway, K.F.5
-
33
-
-
0032633731
-
4 in oxide/nitride/oxide for Metal/Oxide/Nitride/Oxide/Silicon nonvolatile memories
-
4 in oxide/nitride/oxide for Metal/Oxide/Nitride/Oxide/Silicon nonvolatile memories," Jpn. J. Appl. Phys., vol. 38, pp. 1441-1447, 1999.
-
(1999)
Jpn. J. Appl. Phys.
, vol.38
, pp. 1441-1447
-
-
Aozasa, H.1
Fujiwara, I.2
Nakamura, A.3
Komatsu, Y.4
-
34
-
-
0032123911
-
2 films
-
Jul.
-
2 films," IEEE Trans. Electron Devices, vol. 45, no. 7, pp. 1554-1560, Jul. 1998.
-
(1998)
IEEE Trans. Electron Devices
, vol.45
, Issue.7
, pp. 1554-1560
-
-
Riccò, B.1
Gozzi, G.2
Lanzoni, M.3
-
35
-
-
0036089628
-
Physical description of anomalous charge loss in floating gate based NVM's and identification of its dominant parameter
-
Dallas, TX
-
F. Schuler, R. Degreave, P. Hendrickx, and D. Wellekens, "Physical description of anomalous charge loss in floating gate based NVM's and identification of its dominant parameter," in Proc. 40th Annu, Reliability Physics Symp., Dallas, TX, 2002, pp. 26-33.
-
(2002)
Proc. 40th Annu, Reliability Physics Symp.
, pp. 26-33
-
-
Schuler, F.1
Degreave, R.2
Hendrickx, P.3
Wellekens, D.4
-
36
-
-
5444274648
-
Statistical simulations for Flash memory reliability analysis and prediction
-
Oct.
-
L. Larcher and P. Pavan, "Statistical simulations for Flash memory reliability analysis and prediction," IEEE Trans. Electron Devices, vol. 51, no. 10, pp. 1636-1643, Oct. 2004.
-
(2004)
IEEE Trans. Electron Devices
, vol.51
, Issue.10
, pp. 1636-1643
-
-
Larcher, L.1
Pavan, P.2
-
37
-
-
0036532414
-
Radiation-induced depassivation of latent plasma damage
-
G. Cellere, A. Paccagnella, L. Pantisano, M. G. Valentini, O. Flament, O. Musseau, and P. G. Fuochi, "Radiation-induced depassivation of latent plasma damage," Microelectron. Eng., vol. 60, no. 3-4, pp. 439-450, 2001.
-
(2001)
Microelectron. Eng.
, vol.60
, Issue.3-4
, pp. 439-450
-
-
Cellere, G.1
Paccagnella, A.2
Pantisano, L.3
Valentini, M.G.4
Flament, O.5
Musseau, O.6
Fuochi, P.G.7
-
38
-
-
0032307020
-
Precursor damage and angular dependence of single event gate rupture in thin oxides
-
Dec.
-
F. W. Sexton, D. M. Fleetwood, M. R. Shaneyfelt, P. E. Dodd, G. L. Hash, L. P. Schanwald, and R. A. Loemker, "Precursor damage and angular dependence of single event gate rupture in thin oxides," IEEE Trans. Nucl. Sci., vol. 45, no. 6, pp. 2509-2518, Dec. 1998.
-
(1998)
IEEE Trans. Nucl. Sci.
, vol.45
, Issue.6
, pp. 2509-2518
-
-
Sexton, F.W.1
Fleetwood, D.M.2
Shaneyfelt, M.R.3
Dodd, P.E.4
Hash, G.L.5
Schanwald, L.P.6
Loemker, R.A.7
-
39
-
-
0003217829
-
Modeling space radiation environments
-
J. Barth, "Modeling space radiation environments," IEEE NSREC Short Course, 1997.
-
(1997)
IEEE NSREC Short Course
-
-
Barth, J.1
-
40
-
-
0035716243
-
Statistical modeling of reliability and scaling projections for flash memories
-
D. Ielmini, A. S. Spinelli, A. L. Lacaita, and A. Modelli, "Statistical modeling of reliability and scaling projections for flash memories," in Interational Electron Devices Meeting (IEDM) Tech. Dig., 2001.
-
(2001)
Interational Electron Devices Meeting (IEDM) Tech. Dig.
-
-
Ielmini, D.1
Spinelli, A.S.2
Lacaita, A.L.3
Modelli, A.4
-
41
-
-
0034205654
-
Low field leakage current and soft breakdown in ultrathin gate oxides after heavy ions, electron or X-ray irradiation
-
Jun.
-
M. Ceschia, A. Paccagnella, S. Sandrin, G. Ghidini, J. Wyss, M. Lavale, and O. Flament, "Low field leakage current and soft breakdown in ultrathin gate oxides after heavy ions, electron or X-ray irradiation," IEEE Trans. Nucl. Sci., vol. 3, no. 47, pp. 566-573, Jun. 2000.
-
(2000)
IEEE Trans. Nucl. Sci.
, vol.3
, Issue.47
, pp. 566-573
-
-
Ceschia, M.1
Paccagnella, A.2
Sandrin, S.3
Ghidini, G.4
Wyss, J.5
Lavale, M.6
Flament, O.7
-
42
-
-
0036685471
-
Micro breakdown in small-area ultra-thin gate oxides
-
Aug.
-
G. Cellere, M. G. Valentini, L. Larcher, and A. Paccagnella, "Micro breakdown in small-area ultra-thin gate oxides," IEEE Trans. Electron Devices, vol. 49, no. 8, pp. 1367-1374, Aug. 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, Issue.8
, pp. 1367-1374
-
-
Cellere, G.1
Valentini, M.G.2
Larcher, L.3
Paccagnella, A.4
-
44
-
-
0035416629
-
Comparison of oxide leakage currents induced by ion implantation and high electric field stress
-
D. Goguenheim, A. Bravaix, C. Monserie, J. M. Moragues, P. Lambert, and P. Boivin, "Comparison of oxide leakage currents induced by ion implantation and high electric field stress," Solid State Electron., vol. 45, pp. 1355-1360, 2001.
-
(2001)
Solid State Electron.
, vol.45
, pp. 1355-1360
-
-
Goguenheim, D.1
Bravaix, A.2
Monserie, C.3
Moragues, J.M.4
Lambert, P.5
Boivin, P.6
|