High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 279-292

  Koay, Chiew Seng ^a   George, Simi ^a   Takenoshita, Kazutoshi ^a   Bernath, Robert ^a   Fujiwara, Etsuo ^a,b   Richardson, Martin ^a   Bakshi, Vivek ^a,c  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b Himeji University   (Japan)

^c SEMATECH   (United States)

Author keywords

EUV; Laser plasmas; Sources; Tin plasmas

Indexed keywords

EUV; LASER-PLASMAS; SOURCES; TIN PLASMAS;

CALIBRATION; SPECTROMETERS; SPECTROSCOPIC ANALYSIS; TIN; ULTRAVIOLET RADIATION;

LASER PRODUCED PLASMAS;

EID: 24644489086     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.596753     Document Type: Conference Paper

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