Laser plasma EUVL sources - Progress and challenges

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 447-453

  Richardson, M ^a   Koay, C S ^a   Takenoshita, K ^a   Keyser, C ^a,d   George, S ^a   Teerawattansook, S ^a   Al Rabban, M ^b   Scott, H ^c  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b QATAR UNIVERSITY   (Qatar)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERSION EFFICIENCY (CE); EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; PLASMA MEDIA; UNRESOLVED TRANSITION ARRAY (UTA);

HEATING; LASER PRODUCED PLASMAS; LIGHT TRANSMISSION; MIRRORS; PARTICULATE EMISSIONS; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 3843051243     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.541586     Document Type: Conference Paper

References (21)

1. Y. Watanabe, K. Ota & H. Franken, "Source requirements," presentation at ISMT EUV source Workshop, Sept 29, 2003.
2. J. Pankert, "Philips' EUV lamp: Status and Roadmap," presentation at ISMT EUV source Workshop, Sept 29, 2003.
3. F. Jin and M. Richardson, Appl.Opt., 34, 750-760, (1995)
4. R. C. Spitzer et al, "Conversion efficiencies from laser plasma for lithography applications" J. Appl. Phys. 79, 2251-58, (1996)
5. F. Jin, K. Gabel, M. Richardson, M. Kado, A.F. Vassiliev, and D. Salzmann, "Mass-limited laser plasma cryogenic target for 13-nm point x-ray sources for lithography," Proc. SPIE, vol. 2015, pp. 151-159, (1993): "Water laser plasma x-ray point source and apparatus", by M. Richardson, M. Kado, K. Gabel & F. Jin, Patent No. 5,459,771, October 1995.
6. F. Jin, K. Gabel, M. Richardson, M. Kado, A.F. Vassiliev, and D. Salzmann, "Mass-limited laser plasma cryogenic target for 13-nm point x-ray sources for lithography," Proc. SPIE, vol. 2015, pp. 151-159, (1993): "Water laser plasma x-ray point source and apparatus", by M. Richardson, M. Kado, K. Gabel & F. Jin, Patent No. 5,459,771, October 1995.
7. "Cluster Beam Targets for Laser Plasma Extreme Ultraviolet and Soft X-ray Sources", G. D. Kubiak and M. Richardson, Patent No. 5,577,092, November 1996.
8. First mentioned in a report by JMAR Res. Corp.at the EUVL Source Workshop, March 2, 2001, Santa Clara, CA.
9. R. D Cowan, "The Theory of Atomic Spectra", Univ. California Press, (1981)
10. M.A. Klosner, and W.T. Silfvast, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region," Opt. Lett., 23,1609 (1998)
11. N. Bowering, M. Martins,. W.N. Partlo, I.V. Fomenkov, "Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations," J. App. Phys., 95, 17 (2004)
12. G. O'Sullivan and P. Dunne, "Spectroscopy of a 13.5nm laser plasma source," presentation at ISMT EUVL Source Workshop, Oct 2002, Dallas, TX
13. C. Keyser, M. Richardson, & E. Turcu "Studies of high-repetition-rate laser plasma EUV sources from droplet targets" Applied Phys. A77, 217-221, 2003
14. C. Keyser, R. Bernath, M. Al-Rabban and Martin Richardson, "Dynamics of mass-limited, laser plasma target as sources for EUV lithography" Jap. Jnl. Appl. Phys 41, pp. (2002)
15. J. Tawney, M. Richardson, "Electro-optic deflector Isolator for short laser pulse contrast enhancement," Proc. CLEO- 2001, p.97 (also submitted for publication.)
16. C-S. Koay, et al., "High conversion efficiency tin material laser plasma source for EUVL", Proc. SPIE, vol. 5037, pp. 801-806 (2003)
17. W. Schwanda, K. Eidmann, and M.C. Richardson, "Characterization of a flat-field grazing-incidence XUV spectrometer," J. X-ray Sci. and Tech., vol. 4, pp. 8-17 (1993)
18. P.A. Rodgers, A.M. Rogoyski, and S. J. Rose, MED101: a laser-plasma simulation code. User guide (Appleton, Rutherford, N.J., 1989)
19. D. Heading, J. Wark, et. al, Phys Rev. E, 56 1997, p936
20. G. Schriever, M. C. Richardson, E. Turcu, "The droplet laser plasma source for EUV lithography," Proceedings of CLEO, pages 393-394, 7-12 May 2000.
21. K. Takenoshita, M. C. Richardson et al., "The repeller field debris mitigation approach for EUV sources," Emerging Lithographic Technologies VII, SPIE, volume 5037, pages 792-800, 2003.