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Volumn 5374, Issue PART 2, 2004, Pages 954-963

Debris studies for the tin-based droplet laser-plasma EUV source

Author keywords

Debris; Euv source; Inhibition; Ion spectra; Mitigation; Tin plasma

Indexed keywords

EUV SOURCES; INHIBITION; ION SPECTRA; MITIGATION; TIN PLASMAS;

EID: 3843147185     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.541533     Document Type: Conference Paper
Times cited : (24)

References (16)
  • 2
    • 3843119285 scopus 로고    scopus 로고
    • This work was done under contract for JMar Research Corp, resulting in patents being filed at that time
    • This work was done under contract for JMar Research Corp, resulting in patents being filed at that time.
  • 3
    • 0141724659 scopus 로고    scopus 로고
    • High conversion efficiency tin material laser plasma source for EUVL
    • C-S. Koay, M. C. Richardson et al., "High conversion efficiency tin material laser plasma source for EUVL," SPIE, volume 5037, pages 801-806, 2003.
    • (2003) SPIE , vol.5037 , pp. 801-806
    • Koay, C.-S.1    Richardson, M.C.2
  • 4
    • 3843143308 scopus 로고    scopus 로고
    • Modular laser produce plasma source for EUV lithography
    • Sep. 29
    • B. Fay et al., "Modular Laser produce Plasma Source for EUV Lithography," presentation at ISMT EUV source workshop, Sep. 29, 2003.
    • (2003) ISMT EUV Source Workshop
    • Fay, B.1
  • 5
    • 3843071452 scopus 로고    scopus 로고
    • Philips' EUV lamp: Status and roadmap
    • Sep. 29
    • J. Pankert, "Philips' EUV lamp: Status and Roadmap," presentation at ISMT EUV source workshop, Sep. 29, 2003.
    • (2003) ISMT EUV Source Workshop
    • Pankert, J.1
  • 6
    • 0000268620 scopus 로고
    • Laser-produced plasmas for soft X-ray projection lithography
    • November
    • W. T. Silfvast, M. C. Richardson et al., "Laser-Produced Plasmas for Soft X-ray Projection Lithography," Journal of Vacuum Science and Technology B, volume 10, number 6, pages 3126-3133, November 1992.
    • (1992) Journal of Vacuum Science and Technology B , vol.10 , Issue.6 , pp. 3126-3133
    • Silfvast, W.T.1    Richardson, M.C.2
  • 7
    • 0000345742 scopus 로고
    • Mass-limited laser plasma cryogenic target for 13 nm point x-ray sources for lithography
    • F. Jin, M. C. Richardson et al., "Mass-limited laser plasma cryogenic target for 13 nm point x-ray sources for lithography," Proceedings of SPIE, volume 2015, pages 151-159, 1993.
    • (1993) Proceedings of SPIE , vol.2015 , pp. 151-159
    • Jin, F.1    Richardson, M.C.2
  • 8
    • 0011981644 scopus 로고    scopus 로고
    • A debris-free laser-plasma EUV source using ice droplets
    • July
    • M. C. Richardson et al., "A Debris-Free Laser-Plasma EUV Source Using Ice Droplets," Proceedings of SPIE, volume 3157, pages 306-309, July 1997.
    • (1997) Proceedings of SPIE , vol.3157 , pp. 306-309
    • Richardson, M.C.1
  • 9
    • 0141612940 scopus 로고    scopus 로고
    • The repeller field debris mitigation approach for EUV sources
    • SPIE
    • K. Takenoshita, M. C. Richardson et al., "The repeller field debris mitigation approach for EUV sources," Emerging Lithographic Technologies VII, SPIE, volume 5037, pages 792-800, 2003.
    • (2003) Emerging Lithographic Technologies VII , vol.5037 , pp. 792-800
    • Takenoshita, K.1    Richardson, M.C.2
  • 10
    • 0034547024 scopus 로고    scopus 로고
    • The droplet laser plasma source for EUV lithography
    • 7-12 May
    • G. Schriever, M. C. Richardson, E. Turcu, "The droplet laser plasma source for EUV lithography," Proceedings of CLEO, pages 393-394, 7-12 May 2000.
    • (2000) Proceedings of CLEO , pp. 393-394
    • Schriever, G.1    Richardson, M.C.2    Turcu, E.3
  • 12
    • 0029253980 scopus 로고
    • A high-power, low-contamination laser plasma source for extreme UV lithography
    • February
    • F. Bijkerk et al., "A high-power, low-contamination laser plasma source for Extreme UV lithography," Microelectronic Engineering, Volume 27, Issues 1-4, February 1995, Pages 299-301
    • (1995) Microelectronic Engineering , vol.27 , Issue.1-4 , pp. 299-301
    • Bijkerk, F.1
  • 13
    • 0141724681 scopus 로고    scopus 로고
    • Study of ultra-fast ion shutter employing a laser-produced plasma
    • SPIE
    • H. Yashiro et al., "Study of ultra-fast ion shutter employing a laser-produced plasma," Emerging Lithographic Technologies VII, SPIE, volume 5037, pages 759-766, 2003.
    • (2003) Emerging Lithographic Technologies VII , vol.5037 , pp. 759-766
    • Yashiro, H.1
  • 14
    • 0037443165 scopus 로고    scopus 로고
    • A comparison of the laser plume from Cu and YBCO studied with ion probes
    • B. Thestrup et al., "A comparison of the laser plume from Cu and YBCO studied with ion probes," Applied Surface 208-209 (2003), 33-38.
    • (2003) Applied Surface , vol.208-209 , pp. 33-38
    • Thestrup, B.1
  • 15
    • 0035498645 scopus 로고    scopus 로고
    • Ion and neutral emission from pulsed laser irradiation of metals
    • L. Torrisi et al., "Ion and neutral emission from pulsed laser irradiation of metals," Nuclear Instruments and Methods in Physics Research B 184 (2001) 327-336.
    • (2001) Nuclear Instruments and Methods in Physics Research B , vol.184 , pp. 327-336
    • Torrisi, L.1
  • 16
    • 0019071839 scopus 로고
    • Ion energy analyzer for laser-produced plasma
    • S S Chowdhury et al., "Ion energy analyzer for laser-produced plasma," 1980 J. Phys. E: Sci. Instrum. 13 1099-1105
    • (1980) J. Phys. E: Sci. Instrum. , vol.13 , pp. 1099-1105
    • Chowdhury, S.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.