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Volumn 5374, Issue PART 2, 2004, Pages 964-970

Spectroscopic studies of the Sn-based droplet laser plasma EUV source

Author keywords

EUV; Laser plasmas; Sources; Tin plasmas

Indexed keywords

EUV; LASER-PLASMAS; SOURCES; TIN PLASMAS;

EID: 3843107901     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.541575     Document Type: Conference Paper
Times cited : (9)

References (28)
  • 2
    • 84975581218 scopus 로고
    • Diffraction-limited soft-x-ray projection imaging using a laser plasma source
    • D.A. Tichenor et al., "Diffraction-limited soft-x-ray projection imaging using a laser plasma source," Opt. Lett. 16, 557 (1991)
    • (1991) Opt. Lett. , vol.16 , pp. 557
    • Tichenor, D.A.1
  • 3
    • 0242468601 scopus 로고    scopus 로고
    • Efficient extreme ultraviolet emission from xenon-cluster jet targets at high repetition rate laser illumination
    • S. Ter-Avetisyan et al., "Efficient extreme ultraviolet emission from xenon-cluster jet targets at high repetition rate laser illumination," J. App. Opt. 94, 5489 (2003)
    • (2003) J. App. Opt. , vol.94 , pp. 5489
    • Ter-Avetisyan, S.1
  • 5
    • 0942289220 scopus 로고    scopus 로고
    • Laser-produced light source development for extreme ultraviolet lithography
    • H. Komori et al., "Laser-produced light source development for extreme ultraviolet lithography," J. Vac. Sci. Tech. B 21, 2843 (2003)
    • (2003) J. Vac. Sci. Tech. B , vol.21 , pp. 2843
    • Komori, H.1
  • 6
    • 0036378636 scopus 로고    scopus 로고
    • Xenon target performance characteristics for laser-produced plasma EUV sources
    • H. Shields et al., "Xenon target performance characteristics for laser-produced plasma EUV sources," Proc. SPIE, vol. 4688, 94 (2002)
    • (2002) Proc. SPIE , vol.4688 , pp. 94
    • Shields, H.1
  • 7
    • 0000345742 scopus 로고
    • Mass-limited laser plasma cryogenic target for 13-nm point x-ray sources for lithography
    • F. Jin, K. Gabel, M. Richardson, M. Kado, A.F. Vassiliev, and D. Salzmann, "Mass-limited laser plasma cryogenic target for 13-nm point x-ray sources for lithography," Proc. SPIE, vol. 2015, pp. 151-159, (1993)
    • (1993) Proc. SPIE , vol.2015 , pp. 151-159
    • Jin, F.1    Gabel, K.2    Richardson, M.3    Kado, M.4    Vassiliev, A.F.5    Salzmann, D.6
  • 8
    • 0029544568 scopus 로고
    • Characterization of a laser plasma water droplet EUV source
    • July
    • F. Jin, M. Richardson, G. Shimkaveg, and D. Torres, "Characterization of a laser plasma water droplet EUV source," Proc. SPIE, vol. 2523, pp. 81-87, (July 1995)
    • (1995) Proc. SPIE , vol.2523 , pp. 81-87
    • Jin, F.1    Richardson, M.2    Shimkaveg, G.3    Torres, D.4
  • 10
    • 0034505216 scopus 로고    scopus 로고
    • A laser generated water plasma source for extreme-ultraviolet lithography and at wavelength interferometry
    • R.C. Constantinescu, J. Jonkers, P. Hegeman, and M. Visser, "A laser generated water plasma source for extreme-ultraviolet lithography and at wavelength interferometry," Proc. SPIE, vol. 4146, 101-112 (2000)
    • (2000) Proc. SPIE , vol.4146 , pp. 101-112
    • Constantinescu, R.C.1    Jonkers, J.2    Hegeman, P.3    Visser, M.4
  • 12
    • 0034768873 scopus 로고    scopus 로고
    • Scaling-up a liquid water jet laser plasma source to high average power for extreme ultraviolet lithography
    • U. Vogt, H. Stiel, I. Will, M. Wieland, T. Wilhein, P.V. Nickles, and W. Sandner, "Scaling-up a liquid water jet laser plasma source to high average power for Extreme Ultraviolet Lithography," Proc. SPIE, vol. 4343, 87-93 (2001)
    • (2001) Proc. SPIE , vol.4343 , pp. 87-93
    • Vogt, U.1    Stiel, H.2    Will, I.3    Wieland, M.4    Wilhein, T.5    Nickles, P.V.6    Sandner, W.7
  • 13
    • 3843095458 scopus 로고    scopus 로고
    • G. Schriever, M.Richardson and E.Turcu, (submitted for publication)
    • G. Schriever, M.Richardson and E.Turcu, (submitted for publication)
  • 14
    • 0030107465 scopus 로고    scopus 로고
    • Conversion efficiencies from laser-produced-plasma in the extreme ultraviolet regime
    • R.C. Spitzer, T.J. Orzechowski, D.W. Phillion, R.L. Kauffman, and C. Cerjan, "Conversion efficiencies from laser-produced-plasma in the extreme ultraviolet regime," J. Appl. Phys., vol. 79, pp. 2251-2253 (1996)
    • (1996) J. Appl. Phys. , vol.79 , pp. 2251-2253
    • Spitzer, R.C.1    Orzechowski, T.J.2    Phillion, D.W.3    Kauffman, R.L.4    Cerjan, C.5
  • 16
    • 3743122911 scopus 로고    scopus 로고
    • Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region
    • M.A. Klosner, and W.T. Silfvast, "Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region," Opt. Lett., 23, 1609 (1998)
    • (1998) Opt. Lett. , vol.23 , pp. 1609
    • Klosner, M.A.1    Silfvast, W.T.2
  • 17
    • 0942268376 scopus 로고    scopus 로고
    • Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations
    • N. Bowering, M. Martins, W.N. Partlo, I.V. Fomenkov, "Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations," J. App. Phys., 95, 17 (2004)
    • (2004) J. App. Phys. , vol.95 , pp. 17
    • Bowering, N.1    Martins, M.2    Partlo, W.N.3    Fomenkov, I.V.4
  • 19
    • 0141724659 scopus 로고    scopus 로고
    • High conversion efficiency tin material laser plasma source for EUVL
    • C-S. Koay, et al., "High conversion efficiency tin material laser plasma source for EUVL", Proc. SPIE, vol. 5037, pp. 801-806 (2003)
    • (2003) Proc. SPIE , vol.5037 , pp. 801-806
    • Koay, C.-S.1
  • 20
    • 0141612940 scopus 로고    scopus 로고
    • The repeller field debris mitigation approach for EUV sources
    • K. Takenoshita, C-S. Koay, M. Richardson, I.C.E. Turcu, "The Repeller Field debris mitigation approach for EUV sources", Proc. SPIE, vol. 5037, pp. 792-800 (2003)
    • (2003) Proc. SPIE , vol.5037 , pp. 792-800
    • Takenoshita, K.1    Koay, C.-S.2    Richardson, M.3    Turcu, I.C.E.4
  • 21
    • 3843147757 scopus 로고    scopus 로고
    • JMAR laser, diode-pumped 5000W, 100kHz or TRW laser, diode-pumped Nd:YAG, 4500W, 5kHz
    • JMAR laser, diode-pumped 5000W, 100kHz or TRW laser, diode-pumped Nd:YAG, 4500W, 5kHz
  • 23
    • 3843051243 scopus 로고    scopus 로고
    • Laser plasma EUVL sources: Progress and challenges
    • M. Richardson, "Laser plasma EUVL sources: progress and challenges," Proc. SPIE, vol. 5374 (2004)
    • (2004) Proc. SPIE , vol.5374
    • Richardson, M.1
  • 24
    • 0003375848 scopus 로고
    • Characterization of a flat-field grazing-incidence XUV spectrometer
    • W. Schwanda, K. Eidmann, and M.C. Richardson, "Characterization of a flat-field grazing-incidence XUV spectrometer," J. X-ray Sci. and Tech., vol. 4, pp. 8-17 (1993)
    • (1993) J. X-ray Sci. and Tech. , vol.4 , pp. 8-17
    • Schwanda, W.1    Eidmann, K.2    Richardson, M.C.3
  • 25
    • 3843137787 scopus 로고    scopus 로고
    • X-ray CCD camera model: PI-SX:512 from Princeton Instrument
    • X-ray CCD camera model: PI-SX:512 from Princeton Instrument
  • 27
    • 0001421260 scopus 로고
    • Tunable narrowband soft x-ray source for projection lithography
    • G. O'Sullivan and R. Faulkner, "Tunable narrowband soft x-ray source for projection lithography," Opt. Eng., vol. 33, pp. 3978-3983 (1994)
    • (1994) Opt. Eng. , vol.33 , pp. 3978-3983
    • O'Sullivan, G.1    Faulkner, R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.