Scaling-up a liquid water jet laser plasma source to high average power for Extreme Ultraviolet Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 535-542

  Vogt, Ulrich ^a   Stiel, Holger ^a   Will, Ingo ^b   Wieland, Marek ^b   Wilhein, Thomas ^a   Nickles, Peter V ^a   Sandner, Wolfgang ^a  

^a MAX BORN INSTITUT   (Germany)

^b University for Applied Sciences   (Germany)

Author keywords

EUV lithography; High average power lasers; Laser produced plasma; Liquid water jet source

Indexed keywords

HIGH POWER LASERS; JETS; LIGHTING; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); LIQUID WATER JET LASER PLASMA SOURCES;

LASER PRODUCED PLASMAS;

EID: 0034768873     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436685     Document Type: Article

References (13)

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