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Applied Physics B: Lasers and Optics

Volumn 73, Issue 7, 2001, Pages 693-698

Optimization of EUV radiation yield from laser-produced plasma

(5) Dusterer S a Schwoerer, H a Ziegler, W a Ziener, C a Sauerbrey, R a

a FRIEDRICH SCHILLER UNIVERSITY JENA (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LASER PRODUCED PLASMAS; LASER PULSES; LIGHT SOURCES; LITHOGRAPHY; OPTICAL FREQUENCY CONVERSION; OPTIMAL SYSTEMS;

EXTREME ULTRAVIOLET LITHOGRAPHY LIGHT; EXTREME ULTRAVIOLET RADIATION; LASER PARAMETERS; OPTIMAL PULSE DURATION;

ULTRAVIOLET RADIATION;

EID: 0035510129 PISSN: 09462171 EISSN: None Source Type: Journal
DOI: 10.1007/s003400100730 Document Type: Article

Times cited : (46)

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