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Volumn 94, Issue 9, 2003, Pages 5489-5496

Efficient extreme ultraviolet emission from xenon-cluster jet targets at high repetition rate laser illumination

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; LASER BEAM EFFECTS; LIGHT SCATTERING; SPECTROMETERS; ULTRAVIOLET RADIATION; X RAYS;

EID: 0242468601     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1614862     Document Type: Article
Times cited : (30)

References (39)
  • 1
    • 0242451849 scopus 로고    scopus 로고
    • Emerging Lithography Technologies IV Proc.
    • Proc. SPIE 3997, Emerging Lithography Technologies IV Proc. (2000).
    • (2000) Proc. SPIE , vol.3997
  • 16
    • 25344476832 scopus 로고
    • O. F. Hagena, Surf. Sci. 106, 101 (1981); O. F. Hagena, Rev. Sci. Instrum. 63, 2374 (1992).
    • (1981) Surf. Sci. , vol.106 , pp. 101
    • Hagena, O.F.1
  • 17
    • 36449000155 scopus 로고
    • O. F. Hagena, Surf. Sci. 106, 101 (1981); O. F. Hagena, Rev. Sci. Instrum. 63, 2374 (1992).
    • (1992) Rev. Sci. Instrum. , vol.63 , pp. 2374
    • Hagena, O.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.