The repeller field debris mitigation approach for EUV sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 792-800

  Takenoshita, K ^a   Koay, C S ^a   Richardson, M ^a   Turcu, I C E ^b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b JMAR Technologies Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; ELECTROSTATICS; LASER APPLICATIONS; OPTICAL MICROSCOPY; PLASMA SOURCES; SCANNING ELECTRON MICROSCOPY; TARGETS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

COMPREHENSIVE ANALYSIS; EXTREME ULTRAVIOLET SOURCES; LASER PLASMA SOURCE; MASS-LIMITED TARGET; REPELLER FIELD DEBRIS MITIGATION;

LIGHT SOURCES;

EID: 0141612940     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504570     Document Type: Conference Paper

References (8)

1. F. Jin, K. Gabel, M. Richardson, M. Kado, A.F. Vassiliev, and D. Salzmann, "Mass-limited laser plasma cryogenic target for 13 nm point x-ray sources for lithography," Proc. SPIE, vol. 2015, pp. 151-159, 1993
2. M. Richardson, D. Torres, C. DePriest, F. Jin, and G. Shimkaveg, "Mass-limited, debris-free laser plasma EUV source," Optics Comm., 145, pp. 109-112 (1998)
3. R.C. Constantinescu, J. Jonkers, P. Hegeman, and M. Visser, "A laser generated water plasma source for extreme-ultraviolet lithography and at wavelength interferometry," Proc. SPIE, vol. 4146, 101-112 (2000)
4. S. Dusterer, H. Schwoerer, W. Ziegler, C. Ziener, and R. Sauerbrey, "Optimization of EUV radiation yield from laser-produced plasma," App. Phys. B, 73, 693-698 (2001)
5. G. Shriever, M. Richardson & E. Turcu, The droplet laser plasma source for EUV lithography, Proc. CLEO 2000, p. 393-394 (2000)
6. I.C.E. Turcu, H. Rieger, A. Stone, J.H. Morris, H. Shields, M. C. Richardson, C. Keyser, K. Takenoshita, Chiew-seng Koay, "Overview of High Efficiency EUV Source Generated by Laser-Produced-Plasma" Extreme ultraviolet lithography (EUVL) source workshop, Oct. 14, 2002
7. T. Tomie, T. Aota, Y. Kurashima, N. Kandaka, H. Yashiro, K. Nishigori, I. Matsushima, and M. Komuro, "Study of a Cavity-confined Plasma as a Debris-Less and High Conversion Efficiency for EUV lithography," Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387), Pages 284-285
8. M. Richardson and G. Schriever, US Patent 6,377,651, (2002)